ENRIQUE
COMESAÑA FIGUEROA
Profesor axudante doutor
Swansea University
Swansea, Reino UnidoPublicacións en colaboración con investigadores/as de Swansea University (8)
2021
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Impact of metal grain granularity on three gate-all-around advanced architectures
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
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Simulations of statistical variability in n-Type FinFET, nanowire, and nanosheet FETs
IEEE Electron Device Letters, Vol. 42, Núm. 10, pp. 1416-1419
2014
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Influence of device geometry on electrical characteristics of a 10.7 nm SOI-FinFET
2014 International Workshop on Computational Electronics, IWCE 2014
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Influence of textured interfaces in the performance of a-Si:H double-junction solar cell
2014 International Workshop on Computational Electronics, IWCE 2014
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Random dopant, line-edge roughness, and gate workfunction variability in a nano InGaAs finFET
IEEE Transactions on Electron Devices, Vol. 61, Núm. 2, pp. 466-472
2013
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Simulation of the spin polarization and the charge transport in Zener tunnel junctions based on ferromagnetic GaAs and ZnO
Computer Physics Communications, Vol. 184, Núm. 3, pp. 746-756
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Three-dimensional simulations of random dopant and metal-gate workfunction variability in an In0.53 Ga 0.47 As GAA MOSFET
IEEE Electron Device Letters, Vol. 34, Núm. 2, pp. 205-207
2012
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3D simulations of random dopant induced threshold voltage variability in inversion-mode In0.53Ga0.47As GAA MOSFETs
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD