3D simulation study of work-function variability in a 25 nm metal-gate FinFET with curved geometry using voronoi grains
- Indalecio, G.
- Garcia-Loureiro, A.J.
- Aldegunde, M.
- Kalna, K.
Actas:
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
ISBN: 9780615717562
Ano de publicación: 2012
Páxinas: 149-152
Tipo: Achega congreso