3D simulation study of work-function variability in a 25 nm metal-gate FinFET with curved geometry using voronoi grains
- Indalecio, G.
- Garcia-Loureiro, A.J.
- Aldegunde, M.
- Kalna, K.
Konferenzberichte:
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
ISBN: 9780615717562
Datum der Publikation: 2012
Seiten: 149-152
Art: Konferenz-Beitrag