Workfunction fluctuations in polycrystalline TiN observed with KPFM and their impact on MOSFETs variability
- Ruiz, A.
- Seoane, N.
- Claramunt, S.
- Garciá-Loureiro, A.
- Porti, M.
- Couso, C.
- Martin-Martinez, J.
- Nafria, M.
Zeitschrift:
Applied Physics Letters
ISSN: 0003-6951
Datum der Publikation: 2019
Ausgabe: 114
Nummer: 9
Art: Artikel