Study of surface roughness in extremely small Si nanowire MOSFETs using fully-3D NEGFs

  1. Seoane, N.
  2. Martinez, A.
  3. Brown, A.R.
  4. Asenov, A.
Actas:
Proceedings of the 2009 Spanish Conference on Electron Devices, CDE'09

ISBN: 9781424428397

Ano de publicación: 2009

Páxinas: 180-183

Tipo: Achega congreso

DOI: 10.1109/SCED.2009.4800460 GOOGLE SCHOLAR