2019

1. Combined nanoscale KPFM characterization and device simulation for the evaluation of the MOSFET variability related to metal gate workfunction fluctuations

   Microelectronic Engineering, Vol. 216

2. Workfunction fluctuations in polycrystalline TiN observed with KPFM and their impact on MOSFETs variability

   Applied Physics Letters, Vol. 114, Núm. 9