The exit-wave power-cepstrum transform for scanning nanobeam electron diffraction: robust strain mapping at subnanometer resolution and subpicometer precision

  1. Padgett, E.
  2. Holtz, M.E.
  3. Cueva, P.
  4. Shao, Y.-T.
  5. Langenberg, E.
  6. Schlom, D.G.
  7. Muller, D.A.
Revista:
Ultramicroscopy

ISSN: 1879-2723 0304-3991

Ano de publicación: 2020

Volume: 214

Tipo: Artigo

DOI: 10.1016/J.ULTRAMIC.2020.112994 GOOGLE SCHOLAR