Comparison of Fin-Edge Roughness and Metal Grain Work Function Variability in InGaAs and Si FinFETs

  1. Seoane, N.
  2. Indalecio, G.
  3. Aldegunde, M.
  4. Nagy, D.
  5. Elmessary, M.A.
  6. García-Loureiro, A.J.
  7. Kalna, K.
Journal:
IEEE Transactions on Electron Devices

ISSN: 0018-9383

Year of publication: 2016

Volume: 63

Issue: 3

Pages: 1209-1216

Type: Article

DOI: 10.1109/TED.2016.2516921 GOOGLE SCHOLAR
Data source: Scopus